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| Atomic Physics » Research » Carbon Nanotubes » experimental | ||
Multi-wall carbon nanotubes, MWNT, single-wall carbon nanotube, SWNT and aligned multi-wall carbon nanotubes, AMWNT can be synthesized by Chemical Vapor Deposition (CVD) method. Two hybrids of this technique are involved in the growth study of cabon nanotubes: thermal-CVD and plasma-CVD. Thermal - chemical vapor deposition A thermal-CVD system was built for carbon nanotubes production via gas phase or on substrate surface. The skech of thermal-CVD system consists of quartz tube furnace which can operate till 1200 degreecentigrades. The sketch of our equipment is shown in figure 1. Main advantages of a thermal-CVD are: the absolute ability for mass production of nanotubes material and the controllable growth of carbon nanotubes at a specific location on a substrate for incorporation in electronic device.
Figure 1: Thermal-CVD experimental set-up Plasma Enhanced - chemical vapor deposition A controllable method for cabon nanotubes production is plasma enhanced-CVD. Such a system is often used to grow free standing vertically aligned MWCNT. The set-up which our laboratory is equipt with is a glow discharged type. Briefly, two electrodes are placed in a steinless-steel chamber. The grounded cathode plays the role of a substrate holder and Ohmic heater. On the anod is applied aprox.400V.
Figure 2: Plasma-CVD experimental set-up |
